发明名称 Automated correction of asymmetric enclosure rule violations in a design layout
摘要 Automated techniques may correct certain rule violations, simplifying and automating the design layout of an electronic circuit, whether embodied as a design encoding or as a fabricated electronic circuit. Violations of enclosure design rules, those specifying the minimum amount that a geometry on a first layer must overlap a geometry on a second layer of a design layout, and more specifically, violations of asymmetric enclosure design rules, may be corrected using a geometric construction algorithm. This geometric construction algorithm may use the known width of the geometry on the second layer and a predetermined size factor to determine other parameters for constructing and placing a patch over a violation, such as the patch width, the patch length, the patch starting edge, and the patch direction. Patches may be constructed using different predetermined size factors when asymmetric enclosure violations are located on first layer geometries in different width ranges.
申请公布号 US7380227(B1) 申请公布日期 2008.05.27
申请号 US20050261960 申请日期 2005.10.28
申请人 SUN MICROSYSTEMS, INC. 发明人 LI MU-JING
分类号 G06F17/50 主分类号 G06F17/50
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