发明名称 |
Method for producing self-aligned mask, articles produced by same and composition for same |
摘要 |
A method for forming a self-aligned pattern on an existing pattern on a substrate comprising applying a coating of a solution containing a masking material in a carrier, the masking material being either photo or thermally sensitive; performing a blanket exposure of the substrate; and allowing at least a portion of the masking material to preferential develop in a fashion that is replicates the existing pattern of the substrate. The existing pattern may be comprised of a first set of regions of the substrate having a first reflectivity and a second set of regions of the substrate having a second reflectivity different from the first composition. The first set of regions may include one or more metal elements and the second set of regions may include a dielectric. Structures made in accordance with the method.
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申请公布号 |
US7378738(B2) |
申请公布日期 |
2008.05.27 |
申请号 |
US20030653476 |
申请日期 |
2003.09.02 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BRUNNER TIMOTHY A.;COLBURN MATTHEW E.;HUANG ELBERT;SANKARAPANDIAN MUTHUMANICKAM |
分类号 |
H01L23/48;G03F7/00;G03F7/20;H01L23/52;H01L23/58;H01L29/40 |
主分类号 |
H01L23/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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