发明名称 Source side injection storage device with control gates adjacent to shared source/drain and method therefor
摘要 A storage device has a two bit cell in which the select electrode is nearest the channel between two storage layers. Individual control electrodes are over individual storage layers. Adjacent cells are separated by a doped region that is shared between the adjacent cells. The doped region is formed by an implant in which the select gates of adjacent cells are used as a mask. This structure provides for reduced area while retaining the ability to perform programming by source side injection.
申请公布号 US7378314(B2) 申请公布日期 2008.05.27
申请号 US20050170446 申请日期 2005.06.29
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 HONG CHEONG M.;CHINDALORE GOWRISHANKAR L.
分类号 H01L21/336 主分类号 H01L21/336
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