APPARATUS AND METHOD FOR DRYING SUBSTRATE

摘要

An apparatus and a method for drying a substrate are provided to stabilize the surface of a rinsing liquid by performing the drying in a decompressed state. A vacuum chamber(10) has a cover which can be closed and opened. A drying bath(20) for receiving a plurality of substrates is mounted at the lower part of the vacuum chamber. A pipeline(80) is disposed at the bottom end of the drying bath, and supplies a rinsing liquid into the drying bath uniformly. A vacuum pump(30) decompress a pressure of the inside of the vacuum chamber so as to prevent the shaking of the surface of the rinsing liquid.