| 摘要 |
<p>A lithographic apparatus and a device manufacturing method are provided to improve level of aberration correction at the high degree of precision, by using a plurality of transmissive deformable lens elements within the lithographic apparatus. A lithographic apparatus comprises a projection system(PL), a deformable lens element, a plurality of magnetic dipoles, and a plurality of magnetic actuators. The projection system is configured to project a patterned radiation beam(B) onto a target of a substrate(W). The deformable lens element is arranged to allow the patterned radiation beam to pass through before the patterned radiation beam reaches the substrate. The magnetic dipoles are connected to the deformable lens element through a support frame. The magnetic actuators are configured to cooperate with more than one of the magnetic dipoles to apply bending moment in a direction of tangential line to a portion of the deformable lens element.</p> |
