MAGNETRON SPUTTERING APPARATUS

摘要

A magnetron sputtering apparatus enabling improvement of the film-forming speed by increasing the erosion density on the target at every movement and prolongation of the target life by realizing uniform consumption of the target by moving the erosion region with time. Plate magnets (3) are arranged around a columnar rotary shaft (2). A high-density erosion region is formed on a target (1) by rotating the columnar rotary shaft (2) so as to increase the film-forming speed. Since the erosion region is moved with rotation of the columnar rotary shaft (2), the target (1) is consumed uniformly.