| 摘要 |
<p>A sputtering target that even when the content of indium is reduced, excels in electrical conductivity, etchability, heat resistance, etc., being available for forming, according to sputtering technique, of a transparent conductive film suitable for use in various applications, such as displays represented by a liquid crystal display, touch panels and solar cells. There is provided a sputtering target containing indium, tin, zinc and oxygen, characterized by further containing a hexagonal layered compound, a spinel-structure compound and a bixbyite-structure compound. In particular, the sputtering target is characterized in that the atomic ratio of the formula In/(In+Sn+Zn) is in the range of 0.33 to 0.6 and the atomic ratio of the formula Sn/(In+Sn+Zn) in the range of 0.05 to 0.15.</p> |
