| 摘要 |
A formulation for removing a material selected from photoresist, ion injection photoresist, etching residue, BARC(bottom antireflective coating) and their combination from a substrate, and a removing method using the formulation are provided to improve the removing efficiency without damage. A formulation for removing a material selected from photoresist, ion injection photoresist, etching residue, BARC and their combination from a substrate comprises ammonium hydroxide; 2-aminobenzothiazole; and the balance of water, wherein the content of the metal contaminant in the hydroxide is 100 ppm or less. Preferably the formulation comprises further an oxidant and an abrasive. Preferably the ammonium hydroxide is selected from tetramethylammonium hydroxide, tetramethylammonium fluoride and their mixture. |
