发明名称 |
NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME |
摘要 |
<p>A nonvolatile memory device and a method of fabricating the same are provided to make dense the texture between an insulating layer and a metal layer by forming double insulating layers out of the lower part metal layer and the intermediate metal layer. A nonvolatile memory device comprises a switching element and a storage node(100) which is connected with the switching element. The storage node comprises a lower metal layer(60). And a first insulating layer(62), an intermediate metal layer(64), a second insulating layer(66), an upper metal layer(68), a carbon nano layer and a passivation layer(80) are formed sequentially on the lower metal layer. The lower metal layer and the intermediate metal layer are made of aluminum.</p> |
申请公布号 |
KR20080046018(A) |
申请公布日期 |
2008.05.26 |
申请号 |
KR20060115425 |
申请日期 |
2006.11.21 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
MOON, CHANG WOOK;JEON, JOONG S.;ELMOSTAFA BOURIM;YANG, HYUN DEOK |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|