发明名称 NONVOLATILE MEMORY DEVICE AND METHOD OF FABRICATING THE SAME
摘要 <p>A nonvolatile memory device and a method of fabricating the same are provided to make dense the texture between an insulating layer and a metal layer by forming double insulating layers out of the lower part metal layer and the intermediate metal layer. A nonvolatile memory device comprises a switching element and a storage node(100) which is connected with the switching element. The storage node comprises a lower metal layer(60). And a first insulating layer(62), an intermediate metal layer(64), a second insulating layer(66), an upper metal layer(68), a carbon nano layer and a passivation layer(80) are formed sequentially on the lower metal layer. The lower metal layer and the intermediate metal layer are made of aluminum.</p>
申请公布号 KR20080046018(A) 申请公布日期 2008.05.26
申请号 KR20060115425 申请日期 2006.11.21
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 MOON, CHANG WOOK;JEON, JOONG S.;ELMOSTAFA BOURIM;YANG, HYUN DEOK
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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