| 摘要 |
PROBLEM TO BE SOLVED: To manufacture an electromechanical component manufacturable easily, requiring low cost, and having optimum performance, in particular in terms of motion characteristics. SOLUTION: Manufacturing method according to the invention includes at least five stage, i.e. (a) a stage to form a base board 15 having one silicon region covered partially with two insulating regions, (b) a stage to form a silicon-germanium alloy sacrifice layer with selective epitaxy starting at the uncovered portion of the silicon region, (c) a stage to form a silicon layer having one mono-crystalline region arranged on the sacrifice layer and two multi-crystalline regions arranged on the insulating regions and having undergone a doping in a high concentration by the epitaxy, (d) a stage to simultaneously form a vibrational structure and a working electrode by etching the prescribed patterns in the mono-crystalline region so that a space is formed between the electrode 23 and the vibrational structure 22, and (e) a stage to remove the sacrifice layer of silicon-germanium alloy by means of selective etching. COPYRIGHT: (C)2008,JPO&INPIT
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