发明名称 HIGH PURITY HAFNIUM MATERIAL AND METHOD OF MANUFACTURING THE MATERIAL BY USING SOLVENT EXTRACTION METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To solve the problem wherein a high purity hafnium material suitable for electronic materials has not been prepared so far since the separation of zirconium resembling to hafnium in chemical properties is difficult, although hafnium-based materials are expected to be used as frontier electronic materials such as insulated gate materials. <P>SOLUTION: The present invention can provide the high purity hafnium material containing 1 wt. ppm or lower of zirconium and other impurity elements by a method based on the solvent extraction method using a TBP (tributyl phosphate) solvent, and its manufacturing method. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008115063(A) 申请公布日期 2008.05.22
申请号 JP20060326288 申请日期 2006.11.06
申请人 KAWASAKI MITSUHIDE 发明人 KAWASAKI MITSUHIDE
分类号 C01G27/00;C22B3/26;C22B34/14;C22C27/00;C30B29/02 主分类号 C01G27/00
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