| 摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition apparatus which extends the usable life of a film thickness monitor and makes the tact time, the product yield rate, and the manufacturing cost appropriate. SOLUTION: This vapor deposition apparatus includes a vapor deposition source having an opening 5 for vapor deposition, and an opening 6 for a film thickness monitor. The opening 5 for vapor deposition is placed so as to face a quartz glass substrate which is a substrate to be vapor-deposited. The opening 6 for the film thickness monitor is placed towards a direction except the direction towards the quartz glass substrate which is the substrate to be vapor-deposited. The film thickness monitor 7 is placed at a position directly facing the opening 6 for the film thickness monitor. COPYRIGHT: (C)2008,JPO&INPIT
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