发明名称 PROCESS FOR PRODUCING GROUP III ELEMENT NITRIDE CRYSTAL
摘要 A process for producing a Group III element nitride crystal (20) having a main plane (20m) orienting in any specific direction other than {0001}. The process comprises: a step in which Group III element nitride crystal substrates (10p) and (10q) respectively having main planes (10pm) and (10qm) orienting in the specific direction are cut out of a Group III element nitride bulk crystal (1); a step in which these substrates (10p) and (10q) are closely arranged side by side so that the main planes (10pm) and (10qm) of these substrates (10p) and (10q) are parallel to each other and their planes facing [0001] are oriented in the same direction; and a step in which a Group III element nitride crystal (20) is grown on the main planes (10pm) and (10qm) of these substrates (10p) and (10q).
申请公布号 WO2008059875(A1) 申请公布日期 2008.05.22
申请号 WO2007JP72096 申请日期 2007.11.14
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD.;MIZUHARA, NAHO;UEMATSU, KOJI;MIYANAGA, MICHIMASA;TANIZAKI, KEISUKE;NAKAHATA, HIDEAKI;NAKAHATA, SEIJI;OKAHISA, TAKUJI 发明人 MIZUHARA, NAHO;UEMATSU, KOJI;MIYANAGA, MICHIMASA;TANIZAKI, KEISUKE;NAKAHATA, HIDEAKI;NAKAHATA, SEIJI;OKAHISA, TAKUJI
分类号 C30B29/38;C30B25/20;H01L21/205 主分类号 C30B29/38
代理机构 代理人
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