发明名称 IMPRINT LITHOGRAPHY APPARATUS AND METHODS
摘要 An apparatus for forming a pattern in a curable material carried on a substrate (108) having one or more components with coefficients of thermal expansion that are substantially equal to the coefficient of thermal expansion of the substrate (108).
申请公布号 WO2007146031(A3) 申请公布日期 2008.05.22
申请号 WO2007US13374 申请日期 2007.06.06
申请人 HEWLETT-PACKARD DEVELOPMENT COMPANY, L.P.;WU, WEI;WANG, SHIH-YUAN;YU, ZHAONING;WILLIAMS, R. STANLEY, 发明人 WU, WEI;WANG, SHIH-YUAN;YU, ZHAONING;WILLIAMS, R. STANLEY,
分类号 G03F7/00 主分类号 G03F7/00
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