EUV PELLICLE WITH INCREASED EUV LIGHT TRANSMITTANCE
摘要
<p>According to one exemplary embodiment, an extreme ultraviolet (EUV) pellicle (106) for protecting a lithographic mask (104) includes an aerogel film (122). The pellicle further includes a frame (124) for mounting the aerogel film over the lithographic mask. The aerogel film causes the pellicle to have increased EUV light transmittance.</p>
申请公布号
WO2008060465(A1)
申请公布日期
2008.05.22
申请号
WO2007US23645
申请日期
2007.11.09
申请人
ADVANCED MICRO DEVICES, INC.;WOOD, OBERT, REEVES, II;RYOUNG-HAN, KIM;WALLOW, THOMAS
发明人
WOOD, OBERT, REEVES, II;RYOUNG-HAN, KIM;WALLOW, THOMAS
