发明名称 POWER TRENCH MOSFETS HAVING SIGE/SI CHANNEL STRUCTURE
摘要 <p>Devices, methods, and processes that improve immunity to transient voltages and reduce parasitic impedances. Immunity to unclamped inductive switching events is improved. For example, a trench-gated power MOSFET device having a SiGe source is provided, where the SiGe source reduces parasitic npn transistor gain by reducing hole current in the body or well region, thereby decreasing the likelihood of a latch-up condition. A trench-gated power MOSFET device having a SiGe body or well region is also provided. A SiGe body reduces hole current when the body diode is turned on, thereby reducing reverse recovery power losses. Other device characteristics are also improved. For example, parasitic gate impedance can reduced through the use of a poly SiGe gate. Also, channel resistance can be reduced through the use of a SiGe layer near the device s gate and a thick oxide region can be formed under the trench gate to reduce gate-to-drain capacitance.</p>
申请公布号 WO2008027722(A3) 申请公布日期 2008.05.22
申请号 WO2007US75911 申请日期 2007.08.14
申请人 FAIRCHILD SEMICONDUCTOR CORPORATION;PARK, CHANHO;WANG, QI 发明人 PARK, CHANHO;WANG, QI
分类号 H01L29/80 主分类号 H01L29/80
代理机构 代理人
主权项
地址