| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound, and a polymer compound using the compound as a monomer unit, and suitable for a component of a positive type resist composition. <P>SOLUTION: The compound is represented by general formula (I) (wherein, R is a hydrogen atom, a halogen atom, a lower alkyl group or a halogenated lower alkyl group; R<SP>1</SP>to R<SP>3</SP>are each independently an alkyl group or a fluorinated alkyl group; with the proviso that the fluorinated alkyl group is a group in which the fluorine atom is not bonded to a carbon atom neighboring to a tertiary carbon atom bonded to R<SP>1</SP>to R<SP>3</SP>, and at least one of R<SP>1</SP>to R<SP>3</SP>is the fluorinated alkyl group; and R<SP>2</SP>and R<SP>3</SP>may form one ring structure). The polymer or the copolymer thereof is also provided. <P>COPYRIGHT: (C)2008,JPO&INPIT |
