| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a photomask manufacturing method capable of preventing pattern defects in a transflective film and/or a light shielding film due to a gas generating during wet etching of the transflective film in the method for manufacturing a photomask from a mask blank having the transflective film and the light shielding film successively formed on the light transmitting substrate by patterning the light shielding film and the transflective film. <P>SOLUTION: The method for manufacturing the photomask aims to maufacture the photomask from the mask blank having the transflective film having a function of controlling the transmission quantity of exposure light and made of a material containing metal and silicon and the light shielding film shielding against the exposure light, successively formed on a light transmitting substrate, by patterning the light shielding film and the transflective film. The method is characterized in that: patterning the transflective film is carried out by wet etching using an etching liquid containing at least one fluorine compound selected from hydrofluoric acid, silicon hydrofluoric acid and fluorinated hydrogen ammonium, and at least one oxidizing agent selected from hydrogen peroxide, nitric acid and sulfuric acid; and the etching liquid is prepared by setting a molar ratio of the fluorine compound to the oxidizing agent in the etching liquid to the molar ratio preventing a pattern defect by the gas generating during wet etching. <P>COPYRIGHT: (C)2008,JPO&INPIT</p> |
