METHOD, DEVICE AND PROGRAM FOR CREATING ELECTRON BEAM LITHOGRAPHY DATA, AND ELECTRON BEAM LITHOGRAPHY APPARATUS

摘要

PROBLEM TO BE SOLVED: To enhance reduction efficiency of the number of shots while suppressing generation of minute pattern when a pattern is drawn by interconnection CP (Character Projection) method.

SOLUTION: In the method for creating electron beam lithography data used in electron beam lithography for transferring a plurality of aperture patterns simultaneously on a sample by periodically irradiating a character aperture where linear aperture patterns are arranged periodically with an electron beam, a combination of the width of one or a plurality of kinds of linear pattern and the distance between patterns is set as a rule of character pattern extraction (S1), the length of an extracted pattern and the length of residual part of an extracted pattern are set as parameters of character pattern extraction (S2), and then a linear periodic character pattern is extracted from a drawing object pattern based on the extraction rule and the extraction parameters (S3).

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