LITHOGRAPHIC APPARATUS AND METHOD OF MANUFACTURING DEVICE

摘要

PROBLEM TO BE SOLVED: To prevent local variation and deformation of refractive indexes of optical elements owing to uneven heating of them by a radiation beam resulting in prevention of deformation of air images projected on a resist layer.

SOLUTION: A lithographic equipment including an optical arrangement with an array of optical elements arranged in a plane perpendicular to the radiation beam is disclosed. Each optical element comprises an electrical heating device to change an optical path length of the radiation beam. By selectively operating the heating devices, a position dependent change in optical path length can be achieved in order to correct irradiation-induced optical path length errors.

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