发明名称 |
MANUFACTURING METHOD OF DISPLAY DEVICE, AND ETCHING APPARATUS |
摘要 |
PROBLEM TO BE SOLVED: To provide a method for manufacturing a display device which is capable of improving material use efficiency and of simplifying manufacturing processes. SOLUTION: In this method for manufacturing a display device, a tube is disposed on a region of an insulating layer where an opening is to be formed, and a processing agent (etching gas or etching liquid) is discharged onto the insulating layer. The insulating layer is selectively eliminated by discharged processing agent (etching gas or etching liquid) to form an opening in the insulating layer. As a result, the insulating layer having the opening is formed on a conductive layer, and the conductive layer lying under the insulating layer is exposed on the bottom of the opening. A conductive film is formed in the opening so as to contact with the exposed portion of the conductive layer, and is electrically connected to the conductive layer in the opening of the insulating layer. COPYRIGHT: (C)2008,JPO&INPIT |
申请公布号 |
JP2008118123(A) |
申请公布日期 |
2008.05.22 |
申请号 |
JP20070265332 |
申请日期 |
2007.10.11 |
申请人 |
SEMICONDUCTOR ENERGY LAB CO LTD |
发明人 |
TANAKA KOICHIRO;MORISUE MASAFUMI |
分类号 |
H01L21/768;H01L21/28;H01L21/288;H01L21/302;H01L21/3205;H01L21/336;H01L29/786;H01L51/50;H05B33/10 |
主分类号 |
H01L21/768 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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