LITHOGRAPHY APPARATUS AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a lithography apparatus in which the decrease of an utilizable total space in the lithography apparatus is prevented by decreasing a large occupied area of an illuminator which uses an array having individually controllable elements for controlling the angular intensity distribution of an illumination beam.

SOLUTION: An illuminator for the lithography apparatus contains an array having individually controllable elements for controlling the angular intensity distribution of an illumination beam capable of changing the angular intensity distribution of an incident illumination beam of a radiation which is provided on a curved surface supporting structure or is provided so that the array functions as a curved surface reflecting surface.

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