| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate processing apparatus capable of continuously feeding a processing liquid having reduced variation in temperature to a substrate to be processed. SOLUTION: The processing apparatus 10 is provided with processing liquid constituent feeding lines 31, 32, 33; a mixer 40 for generating the processing liquid from processing liquid constituents to be fed from the processing constituent feeding lines; a transfer line 37 having one end connected to the mixer; a reservoir tank 51 for receiving the processing liquid via the transfer line; a circulation line 54 for forming a circulation path in cooperation with the reservoir tank; a feeding line 39 branched from the circulation line; and a temperature controller 57 provided on the circulation line. A heat exchanger 60 is formed by a part of the circulation line. The heat exchanger exchanges heat between the processing liquid in the circulation line and a processing liquid before transfer or the processing constituents. COPYRIGHT: (C)2008,JPO&INPIT
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