发明名称 |
POLYAMIDE-IMIDE, METHOD FOR PRODUCING POLYAMIDE-IMIDE, AND RESIN COMPOSITION AND RESIN VARNISH CONTAINING POLYAMIDE-IMIDE |
摘要 |
PROBLEM TO BE SOLVED: To provide a polyamide-imide effective for relaxing the thermal stress in the mounting of a semiconductor chip, having excellent heat-resistance and desmear resistance and enabling low-temperature curing in the case of using by mixing with an epoxy resin. SOLUTION: The polyamide-imide has 2-20 phenolic hydroxyl groups in the molecule and a≥18C long-chain hydrocarbon chain structure in the main chain. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008115365(A) |
申请公布日期 |
2008.05.22 |
申请号 |
JP20070245577 |
申请日期 |
2007.09.21 |
申请人 |
HITACHI CHEM CO LTD |
发明人 |
KAMIYAMA KENICHI;OGAWA NOBUYUKI;MASUDA KATSUYUKI;EJIRI TAKAKO |
分类号 |
C08G73/14;C08G18/34;C08G59/62;C08L63/00;C08L79/08;H05K1/03 |
主分类号 |
C08G73/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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