发明名称 POLYAMIDE-IMIDE, METHOD FOR PRODUCING POLYAMIDE-IMIDE, AND RESIN COMPOSITION AND RESIN VARNISH CONTAINING POLYAMIDE-IMIDE
摘要 PROBLEM TO BE SOLVED: To provide a polyamide-imide effective for relaxing the thermal stress in the mounting of a semiconductor chip, having excellent heat-resistance and desmear resistance and enabling low-temperature curing in the case of using by mixing with an epoxy resin. SOLUTION: The polyamide-imide has 2-20 phenolic hydroxyl groups in the molecule and a≥18C long-chain hydrocarbon chain structure in the main chain. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008115365(A) 申请公布日期 2008.05.22
申请号 JP20070245577 申请日期 2007.09.21
申请人 HITACHI CHEM CO LTD 发明人 KAMIYAMA KENICHI;OGAWA NOBUYUKI;MASUDA KATSUYUKI;EJIRI TAKAKO
分类号 C08G73/14;C08G18/34;C08G59/62;C08L63/00;C08L79/08;H05K1/03 主分类号 C08G73/14
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