摘要 |
<p>Disclosed is a method for forming an organic thin film, which enables to quickly form a dense monomolecular film containing less impurities. Specifically disclosed is a method for forming an organic thin film, which comprises: (1) a step for preparing a hydroxyl group-containing solution by mixing the components (a), (b) and (c) below so that the total amount of the surfactants (A) and (B) below in the hydroxyl group-containing solution is 0.1-80% by weight, and then subjecting the mixture to hydrolysis for producing a hydroxyl group-containing compound; (a) an organic film-forming assistant containing, in an organic solvent, a metal surfactant (A) having at least one hydrolyzable group and a compound (C) interactive with a metal surfactant; (b) a metal surfactant (B) having at least one hydrolyzable group; and (c) water (2) a step for preparing an organic thin film-forming solution by mixing the hydroxyl group-containing solution obtained in the step (1) with an organic solvent; and (3) a step for bringing the organic thin film-forming solution obtained in the step (2) into contact with a substrate.</p> |
申请人 |
NIPPON SODA CO., LTD.;HIDAKA, TOMOYA;FUJITA, YOSHITAKA;NAKAMOTO, NORIFUMI;KUMAZAWA, KAZUHISA;HOSHI, EIJI |
发明人 |
HIDAKA, TOMOYA;FUJITA, YOSHITAKA;NAKAMOTO, NORIFUMI;KUMAZAWA, KAZUHISA;HOSHI, EIJI |