发明名称 |
SUBSTRTE SUPPORT STRUCTURE, HEAT TREATMENT APPARATUS USING SAME, FIRST SHEET-LIKE OBJECT FOR USE IN THE SUBSTRATE SUPPORT STRUCTURE, METHOD OF MANUFACTURING THE SUBSTRATE SUPPORT STRUCTURE, HEAT TREATMENT APPARATUS, AND SUBSTRATE SUCKING METHOD |
摘要 |
A heat treatment apparatus includes a support sheet placed on an upper surface of a heat-treating plate. The support sheet has, formed on an upper surface thereof, projections for contacting and supporting a substrate, and a lip for contacting edge regions of the substrate. The support sheet is formed by an etching process, and therefore areas of the sheet around the projections are recessed, rather than being perforated as in the case of laser processing. These heat-treating plate and support sheet constitute a substrate support structure capable of supporting the substrate properly. |
申请公布号 |
KR100831446(B1) |
申请公布日期 |
2008.05.22 |
申请号 |
KR20070027648 |
申请日期 |
2007.03.21 |
申请人 |
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发明人 |
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分类号 |
H01L21/324;H01L21/00;H01L21/02;H01L21/477 |
主分类号 |
H01L21/324 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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