| 摘要 |
PROBLEM TO BE SOLVED: To provide a polishing fluid for metal capable of preparing condensate of a high-concentration polishing fluid for metal without losing polishing characteristics, to provide a method of manufacturing the polishing fluid for metal capable of shortening manufacturing time sharply by speeding up the dissolution of a solid compound, such as a metal oxide dissolving agent excluding an abrasive grain and metal anticorrosive, and to provide a method of polishing a film to be polished having features, where a polishing surface plate and a substrate are moved relatively while the polishing fluid for metal is being supplied and the substrate having the film to be polished is being pressed against abrasive cloth. SOLUTION: The polishing fluid for metal contains a solvent capable of dissolving not less than a 50 g solid compound in the metal oxide dissolving agent, metal anticorrosive, and metal anticorrosive per litter. In the polishing fluid for metal, the metal anticorrosive is a nitrogen-containing heterocyclic compound, and the solvent is at least one of 3-methyl-3-methoxy butanol and isoprene glycol. The method of manufacturing the polishing fluid for metal and the polishing method using the polishing fluid for metal are provided. COPYRIGHT: (C)2008,JPO&INPIT
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