APPARATUS AND METHOD FOR EXPOSING SUBSTRATE

摘要

An apparatus and a method of exposing a substrate are provided to grasp properties of fluid using various measuring devices by simultaneously providing a small amount of fluid and a large amount of fluid according to properties of the measuring devices. An apparatus of exposing a substrate includes a light source, an illumination optical system, a projection optical system, and an immersion lithography unit. The light source emits light. The illumination optical system emits the light from the light source toward a reticle loaded on a reticle stage. The projection optical system irradiates the light from the reticle toward the substrate loaded on a substrate stage. The immersion lithography unit provides liquid to an optical path between the projection optical system and the substrate. The immersion lithography unit includes a vessel filled with the liquid, a supply line supplying the liquid to the vessel, a first drain line draining the liquid in the vessel, and a monitoring unit(100) having at least one or more measuring portions measuring properties of the liquid flowing through the first drain line.