Vorrichtung zum Abrichten eines Polierkissens und Verfahren zum Herstellen des Polierkissens

摘要

A dresser for a chemical and mechanical polishing cloth is provided in which a sintered product constituting the dressing face 2a is obtained by mixing a bonding material 4 consisting of silicon and/or silicon alloy with diamond grit 3, and forming and sintering the mixture. A carbide film 5 generated by sintering silicon in the bonding material into diamond is formed on the surface of the diamond grit 3. Thereby, the diamond grit is firmly bonded with the bonding material, and the bonding material is not dissolved. Preferably, the particles of the diamond grit are arranged on the surface of the bonding member with two-dimensional regularity, the distance between adjacent grits on the smallest lattice formed by the arrangement is within a range between 10 mu m to 3,000 mu m. Thus a uniform dressing surface can be created.