| 摘要 |
A semiconductor manufacturing apparatus and a method for manufacturing a semiconductor device are provided to increase gas capacity by increasing pressure in gas stored in a gas storage portion. A semiconductor manufacturing apparatus includes a reaction chamber(20), a discharge pipe(40), a vacuum discharge unit, a discharge valve, a first supply pipe(41), a second supply pipe(38), a first supply valve(22), a second supply valve(23), and a controller. The reaction chamber receives a substrate. The discharge pipe discharges gases in the reaction chamber. The vacuum discharge unit discharges gases in the reaction chamber through the discharge pipe. The discharge valve opens/closes the discharge pipe. The first supply pipe supplies a first kind of gas to the reaction chamber. The second supply pipe supplies a second kind of gas to the reaction chamber. The first supply valve opens/closes the first supply pipe. The second supply valve opens/closes the second supply pipe. The controller controls the discharge valve, the first supply valve, and the second supply valve. |
