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发明名称
METHODS OF TREATING NON-SPUTTERED REGIONS OF PVD TARGET CONSTRUCTIONS TO FORM PARTICLE TRAPS, AND PVD TARGET CONSTRUCTIONS COMPRISING PROJECTIONS ALONG A NON-SPUTTERED REGION
摘要
申请公布号
EP1552033(B1)
申请公布日期
2008.05.21
申请号
EP20030808031
申请日期
2003.07.11
申请人
HONEYWELL INTERNATIONAL, INC.
发明人
KIM, JAEYEON
分类号
C23C14/34
主分类号
C23C14/34
代理机构
代理人
主权项
地址
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