SOLVENT SOLUBLE STAMP FOR NANO IMPRINT LITHOGRAPHY AND METHOD OF MANUFACTURE THEREOF

摘要

A method of manufacturing a solvent-soluble stamp for nano imprint lithography is provided to copy a plurality of stamps in large quantities by using one substrate. A method of manufacturing a solvent-soluble stamp for nano imprint lithography includes the following steps: coating the upper surface of a substrate with resist and patterning the resist through a lithography process; etching the substrate by using the patterned resist; depositing the polymer(30) which has the form of solvent-soluble resin on the resultant object; physically separating the polymer on which pattern of the substrate is transferred; depositing a metal layer(40) on a upper surface of the separated polymer pattern; depositing metal on a upper surface of the resultant object; and solving the resultant object in solvent to remove the polymer.