| 摘要 |
<p>There is provided a vaporizer capable of vaporizing a liquid material supplied for film deposition in a CVD apparatus, at low temperature. A vaporizer (10) comprises: a vaporizing chamber (60) heated by heaters (66), (76), and (81); a primary filter (80) positioned in a bottom end portion of the vaporizing chamber (60) and heated by the heater (81); a liquid material supply portion (24) for dropping down a flow-controlled liquid material (LM) from upper portion of the vaporizing chamber (60) toward the primary filter (80); a carrier gas guiding passage (78) for guiding a carrier gas (CG) into the underside of the primary filter (80); and a material delivering passage (62) for discharging a mixed gas (VM + CG) including the carrier gas (CG) and a vaporized liquid material (VM) from the top of the vaporizing chamber (60). The liquid material (LM) dropped down onto the primary filter (80) is partially vaporized, while the rest thereof is atomized by being subjected to bubbling effect provided by the carrier gas (CG) flowing from underneath. Since mist provide a larger surface area as compared with that in the state which has not been atomized, the liquid material (LM) can efficiently receive the heat and can be vaporized at low temperature.</p> |
