| 摘要 |
A method of fabricating a device including imprinting a mold having a protrusion against a substrate having a resist layer such that the protrusion engages the resist layer. The mold further has a mask member positioned generally adjacent the resist layer. Radiation energy is then transmitted through the mold and into the resist layer; however, the mask member substantially prevents transmission of the radiation energy therethrough, thereby defining an unexposed area in the resist layer. Once the mold is removed from the substrate, which consequently forms a first feature from nanoimprinting, the unexposed area of resist layer is removed through dissolving in a developer solution.
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