| 摘要 |
<p>A reduced-pressure drying apparatus is provided to inhibit the production of the transfer traces of a substrate contact portion at a coating layer on a substrate minimally. A chamber(106) of a reduced-pressure drying unit(46) is formed by a comparatively flat rectangular body. A space is formed at the inside of the chamber so that a substrate(G) is received. In the carry-in and out direction of the chamber, inlet(110) and outlet(112) with a slit shape are formed at a pair of opposite sidewalls of the chamber. The substrate passes through the inlet and outlet horizontally and narrowly. Gate members(114,116) are attached at the outer wall of the chamber and open and close the inlet and outlet. The upper portion or upper cover of the chamber is removable. Each gate member includes a cover for closing tightly the inlet and outlet with a slit shape.</p> |
