发明名称 Substrate processing apparatus and method with proximity guide and liquid-tight layer
摘要 A proximity member moves in a moving direction (-X) in a condition that an opposed surface of the proximity member is disposed in the vicinity of a substrate surface and that a liquid-tight layer is formed between the opposed surface and the substrate surface, and nitrogen gas is discharged toward an upstream-side interface of the liquid-tight layer from the upstream side (+X) to the proximity member in the moving direction. Thus discharged nitrogen gas is blown selectively and in concentration against an exposed interface portion, a rinsing liquid forming the exposed interface portion is blown away from the substrate surface and the liquid-tight layer, and a substrate surface region which corresponds to the exposed interface portion is dried.
申请公布号 US7373736(B2) 申请公布日期 2008.05.20
申请号 US20060396724 申请日期 2006.03.28
申请人 DAINIPPON SCREEN MFG. CO., LTD. 发明人 MIYA KATSUHIKO
分类号 F26B3/00 主分类号 F26B3/00
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