Apparatus for measuring feature widths on masks for the semiconductor industry

摘要

An apparatus for measuring feature widths on masks 1 for the semiconductor industry is disclosed. The apparatus encompasses a carrier plate 16 that is retained in vibrationally decoupled fashion in a base frame 14 ; a scanning stage 18 , arranged on the carrier plate 16 , that carries a mask 1 to be measured, the mask 1 defining a surface 4 ; and an objective 2 arranged opposite the mask 1 . A liquid 25 is provided between the objective 2 and the surface 4 of the mask 1.