发明名称 Manufacturing method of a tray, a socket for inspection, and a semiconductor device
摘要 The yield of semiconductor devices is to be enhanced. A tray is provided with a plurality of pockets each capable of accommodating a wafer level CSP, and each of the pockets is provided with a base for supporting a plurality of bumps of the wafer level CSP and side walls formed around the base. In the step-to-step carriage in the post-production process of the manufacture of wafer level CSPs and on like occasions, the base supports not the organic film but the plurality of solder bumps. For this reason, it is made possible to prevent the organic film from being flawed or coming off and adhering to the product as foreign matter, and as a result the quality and yield of the wafer level CSPs (semiconductor devices) can be improved.
申请公布号 US7374970(B2) 申请公布日期 2008.05.20
申请号 US20050058237 申请日期 2005.02.16
申请人 RENESAS TECHNOLOGY CORP. 发明人 TAKAHASHI NORIYUKI
分类号 G01R31/26;H01L21/00;B65D21/02;B65D85/86;H01L21/44;H01L21/66;H01L21/673;H01L21/68 主分类号 G01R31/26
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