发明名称 SEMICONDUCTOR PRODUCTION APPARATUS AND PROCESS
摘要 [PROBLEMS] To provide a semiconductor production apparatus capable of modifying an insulating film. [MEANS FOR SOLVING PROBLEMS] Irradiation unit is provided with irradiation means for irradiating an insulating film with a light of wavelength equal to or greater than that corresponding to the absorption edge of the insulating film, the wavelength not greater than that required for severing a bonding group associated with hydrogen of the insulating film.
申请公布号 KR20080043844(A) 申请公布日期 2008.05.19
申请号 KR20087006291 申请日期 2006.04.24
申请人 SHIOYA YOSHIMI 发明人 SHIOYA YOSHIMI
分类号 H01L21/31;H01L21/316 主分类号 H01L21/31
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