| 摘要 |
A method, a computer program, and an apparatus for performing decomposition of a pattern for use in a DPT(Double Patterning Technology) process are provided to achieve simplified fragmentation process by splitting features into multiple patterns. A method of decomposing a target pattern containing features to be printed on a wafer into multiple patterns, the method comprises the steps of: defining a region of influence indicating a minimum necessary space between the features to be imaged; selecting a vertex in association with a feature of the target pattern; determining if an edge of another feature exists within the region of influence with respect to the vertex; and splitting the another feature into two polygons if the edge of the another feature exists within the region of influence. |
