| 摘要 |
A location detection method, a location detection apparatus, a pattern drawing apparatus, and a detected material are provided to detect a location of a target with one imaging process by acquiring an image with respect to the target formed through a collection of plural location detection marks. A plurality of alignment marks(60) are formed in a certain range as an alignment region(92). Each of the alignment marks is a data record code in which a reference location on a substrate(9) and a relative location. In case the substrate is aligned, an image is acquired by imaging the alignment region so that one of the alignment marks is included in the acquired image even though the imaging magnification is high. The alignment mark included in the acquired image is an attention mark and a location of the substrate is calculated based on the attention mark so that the location is detected by one imaging process.
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