X-RAY DIFFRACTION MEASURING METHOD AND X-RAY DIFFRACTION DEVICE

摘要

PROBLEM TO BE SOLVED: To provide an X-ray diffraction device capable of acquiring sufficient diffraction line intensity in a 2θhigh angle domain where the diffraction line intensity is weakened, when the sample quantity is small, and maintaining accurately relative X-ray intensity of a diffraction peak in a 2θmiddle angle domain and in a 2θlow angle domain where the X-ray irradiation width is widened. SOLUTION: In this X-ray diffraction device, an X-ray radiated from an X-ray source F is regulated by a divergence slit 2 and irradiated to the sample S, and a diffraction line R2emitted from the sample S is detected by an X-ray detector 10. A divergence angle of the divergence slit 2 is a fixed value, and the divergence slit 2 is a slit for restricting the X-ray irradiation width in the sample width direction. The sample S is arranged in a longitudinally-elongated manner wherein the sample width is smaller than a standard sample width and the sample height is the same as a standard sample height. The X-ray intensity Iobs(θ) determined based on an output from the X-ray detector 10 is corrected based on an effective divergence angle calculated from the sample width, to thereby acquire the true X-ray intensity Itru(θ). COPYRIGHT: (C)2008,JPO&INPIT