发明名称 POLYAMIC ACID COMPOSITION, METHOD FOR PRODUCING THE SAME, POLYIMIDE RESIN, SEMICONDUCTIVE MEMBER AND IMAGE-FORMING APPARATUS
摘要 <P>PROBLEM TO BE SOLVED: To provide a polyamic acid composition containing polyamic acid and polyaniline particles and having little fluctuation in characteristics after production, a method for producing the same, a polyimide resin having little variance in resistance and excellent in mechanical characteristics and surface characteristics, a semiconductive member, and an image forming apparatus equipped with a belt which is the semiconductive member. <P>SOLUTION: The polyamic acid composition comprises polyamic acid, the polyaniline particles having a fibrous part with an aspect ratio larger than 1 and equal to or less than 100, a dopant and a solvent. <P>COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008111094(A) 申请公布日期 2008.05.15
申请号 JP20070164900 申请日期 2007.06.22
申请人 FUJI XEROX CO LTD 发明人 MIYAMOTO HIROSHI;MORITA SHOICHI;KATO SEIICHI
分类号 C08L79/08;G03G15/00 主分类号 C08L79/08
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