| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist monomer having a sulfonyl group, polymer, and a photoresist composition containing the same. <P>SOLUTION: The photoresist monomer is represented by the chemical formula, wherein R<SP>*</SP>is hydrogen or methyl, R<SB>1</SB>and R<SB>2</SB>are independently a 1-20C alkyl group or without a ketone group, a 4-20C cycloalkyl group, a 6-20C aryl group, or a 7-20C arylalkyl group; any one of R<SB>1</SB>and R<SB>2</SB>can have no functional group; and R<SB>1</SB>and R<SB>2</SB>can together form a ring. <P>COPYRIGHT: (C)2008,JPO&INPIT |
