| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus that exhibits high accuracy and reduces exposure time. <P>SOLUTION: An exposure table 1 is raised to bring a film mask 2 into contact with a substrate 90 to form a closed space 40, which is evacuated by a vacuum pump 60 to carry out primary adhesion between the film mask 2 and the substrate 90. Then pressurized air in the range of 1 kpa to 20 kpa is introduced through an inlet hole 52 to produce a pressurized space between the film mask 2 and a glass 30 to make the film mask 2 further adhere to the substrate 90 and to carry out secondary adhesion. Since the film mask 2 and the substrate 90 are already in an adhering state by the primary adhesion, only a small amount of air is required to be introduced through the inlet hole 52, and an expansion amount by pressurizing is very small, which needs only a short time for completing the introduction of air, and is free from a problem such as deformation by expansion of the film mask 2. <P>COPYRIGHT: (C)2008,JPO&INPIT |
