发明名称 Semiconductor devices having a gate electrode and methods of fabricating the same
摘要 An integrated circuit device includes an integrated circuit substrate and a first gate pattern on the substrate. A non-conductive barrier layer pattern is on the first gate pattern. The barrier layer pattern has openings at selected locations therein extending to the first gate pattern. A second gate pattern is on the barrier layer pattern and extends into the opening in the barrier layer pattern to electrically connect the second gate pattern to the first gate pattern.
申请公布号 US2008111208(A1) 申请公布日期 2008.05.15
申请号 US20070985511 申请日期 2007.11.15
申请人 KIM DAE-IK 发明人 KIM DAE-IK
分类号 H01L29/43;H01L21/283 主分类号 H01L29/43
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