发明名称 MIXED GAS SUPPLY DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a mixed gas supply device by which a sufficient quantity of material of low vapor pressure (iodine gas, for example) can be stably produced in a short time, can be homogeneously mixed with carrier gas in high concentration and can be supplied. SOLUTION: The mixed gas supply device 200 supplies mixed gas which is a mixture of material of low vapor pressure with carrier gas. It includes a storage tank (iodine storage tank 26) for material of low vapor pressure which stores a solid material of low vapor pressure and liquefies the stored solid material of low vapor pressure by heating, a supersonic nozzle 28 which controls the flow rate of the gas of the material of low vapor pressure which is liquefied in the storage tank for material of low vapor pressure and is then vaporized and a mixing nozzle 22 which mixes the gas of the material of low vapor pressure whose flow rate is controlled by the supersonic nozzle 28 with the carrier gas. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008112947(A) 申请公布日期 2008.05.15
申请号 JP20060296637 申请日期 2006.10.31
申请人 KAWASAKI HEAVY IND LTD 发明人 NAGAOKA HIROKI;NAITO NORIYUKI;WANI IKUO
分类号 H01S3/0979 主分类号 H01S3/0979
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