发明名称 Verfahren zur Herstellung von Solarzellen aus amorphem Silizium mittels Naßätzen von Löchern oder Gräben durch Rückseitenelektroden und amorphes Silizium
摘要 A method of amorphous silicon solar cell manufacture comprises forming thin films of transparent electrode, amorphous silicon, and backside electrode, in that order, on a transparent substrate. An alkali resistant metal is used For the backside electrode. The backside electrode and the amorphous silicon layer are wet-etched, thereby opening holes or grooves that penetrate through these layers.
申请公布号 DE4230338(B4) 申请公布日期 2008.05.15
申请号 DE19924230338 申请日期 1992.09.10
申请人 SANYO ELECTRIC CO. LTD. 发明人 MIZUMURA, TAKAYUKI;SAWADA, KENJI;KOJIMA, NAOKI;KAWANISHI, YASUYOSHI;OTSUKI, MASATOSHI
分类号 H01L31/0392;H01L27/142;H01L31/0224;H01L31/06;H01L31/18;H01L31/20 主分类号 H01L31/0392
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