发明名称 |
Protection structure for semiconductor sensor i.e. ion-sensitive field-effect transistor sensor, has insulating layer arranged between semiconducting layer and metallic layer, and electrically insulating semiconducting and metallic layers |
摘要 |
<p>The protection structure (100) has a metallic layer and a semiconducting layer, which is attached on a semiconductor substrate (110). An insulating layer is arranged between the semiconducting layer and the metallic layer, and electrically insulates the semiconducting layer and the metallic layer. The metallic layer has a side, which is turned away from the insulating layer for bringing the side over a protective layer or directly in contact with a measuring medium (130). The protective layer has an oxide layer.</p> |
申请公布号 |
DE102006052863(A1) |
申请公布日期 |
2008.05.15 |
申请号 |
DE20061052863 |
申请日期 |
2006.11.09 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. |
发明人 |
SORGE, STEPHAN;KUNATH, CHRISTIAN;KURTH, EBERHARD |
分类号 |
H01L23/60;G01N27/414 |
主分类号 |
H01L23/60 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|