发明名称 Protection structure for semiconductor sensor i.e. ion-sensitive field-effect transistor sensor, has insulating layer arranged between semiconducting layer and metallic layer, and electrically insulating semiconducting and metallic layers
摘要 <p>The protection structure (100) has a metallic layer and a semiconducting layer, which is attached on a semiconductor substrate (110). An insulating layer is arranged between the semiconducting layer and the metallic layer, and electrically insulates the semiconducting layer and the metallic layer. The metallic layer has a side, which is turned away from the insulating layer for bringing the side over a protective layer or directly in contact with a measuring medium (130). The protective layer has an oxide layer.</p>
申请公布号 DE102006052863(A1) 申请公布日期 2008.05.15
申请号 DE20061052863 申请日期 2006.11.09
申请人 FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 发明人 SORGE, STEPHAN;KUNATH, CHRISTIAN;KURTH, EBERHARD
分类号 H01L23/60;G01N27/414 主分类号 H01L23/60
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