| 摘要 |
<p>Conductive laminate (10) comprising first layer (12) consisting of a metal or transparent conductive material and, superimposed on the first layer (12), second layer (14) consisting of a nitride, carbide or oxide of at least one metal selected from among indium, tin, zinc, aluminum, magnesium, silicon, titanium, vanadium, manganese, cobalt, nickel, copper, gallium, germanium, yttrium, zirconium, niobium, molybdenum, antimony, barium, hafnium, tantalum, tungsten, bismuth, lanthanum, cerium, praseodymium, neodymium, samarium, europium, gadolinium, terbium, dysprosium, holmium, erbium, thulium and ytterbium, or consisting of carbon, wherein the second layer (14) has a work function greater than that of the first layer (12), and wherein the second layer (14) has a thickness of 0.5 to less than 50 nm.</p> |
